Next
Next Just Pink Restore Face Mask
Moisturising face mask.
3
Bien
20
Neutre
0
Mise en garde
0
Éviter
13% bien
87% neutre
0% mise en garde
0% éviter
À propos du produit
- Marque
- Next
- Ingrédients
- 23
- Actifs
- 1
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Water
Aqua
solvent
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Kaolin
Type of clay, China clay
abrasive absorbent anticaking bulking cosmetic colorant opacifying
→
Cetearyl Alcohol
emollient emulsifying emulsion stabilising foam boosting opacifying surfactant viscosity controlling
→
Stearic Acid
PEG-100 Stearate
surfactant
→
Glyceryl Stearate
emollient emulsifying
→
Butylene Glycol
humectant masking skin conditioning solvent viscosity controlling
→
Polyacrylamide
antistatic binding film forming
→
Xanthan Gum
binding emulsifying emulsion stabilising gel forming skin conditioning surfactant viscosity controlling
→
Polyvinyl Alcohol
film forming viscosity controlling
→
Phenoxyethanol
preservative
→
Dimethicone
C13-14 Isoparaffin
emollient solvent
→
Parfum/Fragrance
Fragrance, Parfum
Chlorphenesin
antimicrobial preservative
→
Ethylhexylglycerin
deodorant skin conditioning
→
Simmondsia Chinensis Seed Oil
Jojoba Oil
emollient hair conditioning skin conditioning
→
Laureth-7
emulsifying surfactant
→
O-Cymen-5-Ol
antimicrobial deodorant preservative
→
Disodium EDTA
chelating viscosity controlling
→
Ci 77891
Titanium Dioxide/Ci 77891
cosmetic colorant
→
Ci 14700
Red 4
cosmetic colorant
→
Состав
Water, Glycerin, Kaolin, Cetearyl Alcohol, Stearic Acid, PEG-100 Stearate, Glyceryl Stearate, Butylene Glycol, Polyacrylamide, Xanthan Gum, Polyvinyl Alcohol, Phenoxyethanol, Dimethicone, C13-14 Isoparaffin, Parfum/Fragrance, Chlorphenesin, Ethylhexylglycerin, Simmondsia Chinensis Seed Oil, Laureth-7, O-Cymen-5-Ol, Disodium EDTA, Ci 77891, Ci 14700
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