Odele
Odele Ultra Sensitive Conditioner
Lock in moisture and lock out frizz without irritating your sensitive self. This salon-grade, fragrance-free conditioner performs without causing irritation to sensitive or eczema-prone skin. Fortified with amino acids + oat extract, this formula adds shine, improves manageability and helps prevent damage.
3
Bene
19
Neutro
0
Cautela
1
Evitare
13% bene
83% neutro
0% cautela
4% evitare
Circa il prodotto
- Marchio
- Odele
- Ingrediente
- 23
- Attivo
- 2
Passare il mouse su una riga * fare clic per la scheda
Water
Aqua
solvent
→
Cetearyl Alcohol
emollient emulsifying emulsion stabilising foam boosting opacifying surfactant viscosity controlling
→
Stearyl Alcohol
emollient emulsifying emulsion stabilising foam boosting masking opacifying refatting surfactant viscosity controlling
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Amodimethicone
antistatic hair conditioning
→
Avena Sativa Kernel Extract
Oat Kernel Extract, Colloidal Oatmeal
abrasive antioxidant emollient skin conditioning
→
Amaranthus Caudatus Seed Extract
Amaranth Seed Extract
skin conditioning
→
Hydrolyzed Rice Protein
antistatic hair conditioning skin conditioning
→
Hydroxyethylcellulose
HEC
binding emulsion stabilising film forming stabilising viscosity controlling
→
Tetrasodium Glutamate Diacetate
chelating
→
Diheptyl Succinate
emollient skin conditioning
→
Capryloyl Glycerin/Sebacic Acid Copolymer
film forming hair conditioning skin conditioning skin protecting
→
Behentrimonium Chloride
antistatic hair conditioning preservative
→
Cetrimonium Chloride
antimicrobial antistatic emulsifying preservative surfactant
→
Linoleamidopropyl Pg-Dimonium Chloride Phosphate Dimethicone
hair conditioning
→
Isopropyl Alcohol
antifoaming perfuming solvent viscosity controlling
→
Trideceth 3
Trideceth-15
emulsifying surfactant
→
Acetic Acid
buffering masking
→
Ethylhexylglycerin
deodorant skin conditioning
→
Phenoxyethanol
preservative
→
Sodium Hydroxide
lye
buffering denaturant
→
Citric Acid
buffering chelating masking
→
Состав
Water, Cetearyl Alcohol, Stearyl Alcohol, Glycerin, Amodimethicone, Avena Sativa Kernel Extract, Amaranthus Caudatus Seed Extract, Hydrolyzed Rice Protein, Hydroxyethylcellulose, Tetrasodium Glutamate Diacetate, Diheptyl Succinate, Capryloyl Glycerin/Sebacic Acid Copolymer, Behentrimonium Chloride, Cetrimonium Chloride, Linoleamidopropyl Pg-Dimonium Chloride Phosphate Dimethicone, Isopropyl Alcohol, Trideceth 3, Trideceth-15, Acetic Acid, Ethylhexylglycerin, Phenoxyethanol, Sodium Hydroxide, Citric Acid
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