Clinique
Clinique Take The Day Off Facial Cleansing Mousse
Moisturizer for very dry skin
4
Bene
15
Neutro
0
Cautela
0
Evitare
21% bene
79% neutro
0% cautela
0% evitare
Circa il prodotto
- Marchio
- Clinique
- Ingrediente
- 19
- Attivo
- 3
Passare il mouse su una riga * fare clic per la scheda
Water
Aqua
solvent
→
Myristic Acid
cleansing emulsifying perfuming
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Sodium Methyl Cocoyl Taurate
cleansing foaming surfactant
→
Potassium Hydroxide
buffering
→
Lauric Acid
cleansing emulsifying surfactant
→
Behenic Acid
cleansing emulsifying opacifying surfactant
→
PPG-24-Glycereth-24
emulsifying solvent surfactant
→
Sodium Hyaluronate
humectant skin conditioning
→
Sodium Acetylated Hyaluronate
humectant
→
Butylene Glycol
humectant masking skin conditioning solvent viscosity controlling
→
Caprylyl Glycol
deodorant emollient hair conditioning skin conditioning
→
Glycol Distearate
emollient emulsifying opacifying skin conditioning viscosity controlling
→
Polyquaternium-7
antistatic film forming
→
Hexylene Glycol
emulsifying perfuming skin conditioning solvent surfactant
→
Tetrasodium EDTA
chelating
→
Phenoxyethanol
preservative
→
Sodium Benzoate
anticorrosive masking preservative
→
Ci 60730
cosmetic colorant
→
Состав
Water, Myristic Acid, Glycerin, Sodium Methyl Cocoyl Taurate, Potassium Hydroxide, Lauric Acid, Behenic Acid, PPG-24-Glycereth-24, Sodium Hyaluronate, Sodium Acetylated Hyaluronate, Butylene Glycol, Caprylyl Glycol, Glycol Distearate, Polyquaternium-7, Hexylene Glycol, Tetrasodium EDTA, Phenoxyethanol, Sodium Benzoate, Ci 60730
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