Next
Next Just Pink Relax Face Mask
Moisturising face mask.
3
Bien
19
Neutral
0
Precaución
0
Evitar
14% bien
86% neutral
0% precaución
0% evitar
Sobre el producto
- Marca
- Next
- Ingredientes
- 22
- Activos
- 1
Coloque el cursor sobre una fila * haga clic para ver la tarjeta
Water
Aqua
solvent
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Kaolin
Type of clay, China clay
abrasive absorbent anticaking bulking cosmetic colorant opacifying
→
Cetearyl Alcohol
emollient emulsifying emulsion stabilising foam boosting opacifying surfactant viscosity controlling
→
Stearic Acid
Butylene Glycol
humectant masking skin conditioning solvent viscosity controlling
→
PEG-100 Stearate
surfactant
→
Glyceryl Stearate
emollient emulsifying
→
Polyacrylamide
antistatic binding film forming
→
Xanthan Gum
binding emulsifying emulsion stabilising gel forming skin conditioning surfactant viscosity controlling
→
Polyvinyl Alcohol
film forming viscosity controlling
→
Phenoxyethanol
preservative
→
Dimethicone
C13-14 Isoparaffin
emollient solvent
→
Parfum/Fragrance
Fragrance, Parfum
Simmondsia Chinensis Seed Oil
Jojoba Oil
emollient hair conditioning skin conditioning
→
Ethylhexylglycerin
deodorant skin conditioning
→
Chlorphenesin
antimicrobial preservative
→
Laureth-7
emulsifying surfactant
→
O-Cymen-5-Ol
antimicrobial deodorant preservative
→
Disodium EDTA
chelating viscosity controlling
→
Ci 77891
Titanium Dioxide/Ci 77891
cosmetic colorant
→
Состав
Water, Glycerin, Kaolin, Cetearyl Alcohol, Stearic Acid, Butylene Glycol, PEG-100 Stearate, Glyceryl Stearate, Polyacrylamide, Xanthan Gum, Polyvinyl Alcohol, Phenoxyethanol, Dimethicone, C13-14 Isoparaffin, Parfum/Fragrance, Simmondsia Chinensis Seed Oil, Ethylhexylglycerin, Chlorphenesin, Laureth-7, O-Cymen-5-Ol, Disodium EDTA, Ci 77891
Encontrar productos similares…
El historial de edición aún no se rastrea