Bad Habit Silent Mode Hydrating Hyaluronic Mask
Глубоко увлажните уставшую кожу с помощью этой мультисенсорной маски.
Список ингредиентов
Ключевые ингредиенты:
- antioxidant: Tocopheryl Acetate, Avena Sativa Kernel Extract, Tocopherol
- skin-identical ingredient: Glycerin, Sodium Hyaluronate
- moisturizer/humectant: Aloe Barbadensis Leaf Juice
- soothing: Allantoin
Полный список ингредиентов: Water, Glycerin, Dicaprylyl Carbonate, Propanediol, Propylheptyl Caprylate, Polyacrylate-13, Sodium Acrylates Copolymer, Limnanthes Alba Seed Oil, Phenoxyethanol, Polyisobutene, Sodium Polyacrylate Starch, Lecithin, Saccharide Isomerate, Chlorphenesin, Allantoin, Polysorbate 20, Tocopheryl Acetate, Disodium EDTA, Ethylhexylglycerin, Aloe Barbadensis Leaf Juice, Buteth-3, Glyceryl Acrylate/Acrylic Acid Copolymer, Sodium Benzotriazolyl Butylphenol Sulfonate, Avena Sativa Kernel Extract, Sodium Hyaluronate, [[Tris [Tetramethylhydroxypiperidinol] Citrate|Tris [Tetramethylhydroxypiperidinol] Citrate]], Nymphaea Alba Root Extract, Spirulina Maxima Extract, Tributyl Citrate, Sophora Japonica Flower Extract, Ricinus Communis Seed Oil, Sorbitan Isostearate, Alcohol, Citric Acid, Sodium Citrate, Potassium Sorbate, Tocopherol, Sodium Benzoate, Parfum/Fragrance, Limonene, Linalool, Geraniol, Farnesol, Citral, Ci 60725, Ci 42090