Photozyme
Photozyme Vitamin C+e Ferulic Acid Serum With Dna
15% l-ascorbic acid (vitamin c), 1% vitamin e, 0.5% ferulic acid and loaded with dna repair enzymes
6
Bene
9
Neutro
0
Cautela
0
Evitare
40% bene
60% neutro
0% cautela
0% evitare
Circa il prodotto
- Marchio
- Photozyme
- Ingrediente
- 15
- Attivo
- 7
Passare il mouse su una riga * fare clic per la scheda
Water
Aqua
solvent
→
Ethoxydiglycol
humectant perfuming solvent
→
Ascorbic Acid
Vitamin C, L-ascorbic acid
antioxidant buffering masking skin conditioning
→
Propylene Glycol
humectant skin conditioning solvent viscosity controlling
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Sodium Hyaluronate
humectant skin conditioning
→
Panthenol
Pro-Vitamin B5
antistatic hair conditioning skin conditioning
→
Laureth-23
cleansing emulsifying surfactant
→
Ferulic Acid
antimicrobial antioxidant
→
Photolyase Endonuclease
Arabidopsis Thaliana Extract
antioxidant
→
Tocopherol
Vitamin E
antioxidant masking skin conditioning
→
Phenoxyethanol
preservative
→
Ethylhexylglycerin
deodorant skin conditioning
→
Triethanolamine
buffering emulsifying masking surfactant
→
Состав
Water, Ethoxydiglycol, Ascorbic Acid, Propylene Glycol, Glycerin, Sodium Hyaluronate, Panthenol, Laureth-23, Ferulic Acid, Photolyase Endonuclease, Arabidopsis Thaliana Extract, Tocopherol, Phenoxyethanol, Ethylhexylglycerin, Triethanolamine
Ascorbic Acid
Vitamin C, L-ascorbic acid
antioxidant buffering masking skin conditioning
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Sodium Hyaluronate
humectant skin conditioning
→
Panthenol
Pro-Vitamin B5
antistatic hair conditioning skin conditioning
→
Ferulic Acid
antimicrobial antioxidant
→
Arabidopsis Thaliana Extract
antioxidant
→
Tocopherol
Vitamin E
antioxidant masking skin conditioning
→
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