MG
MG Alpha Hydroxy Acid Essence
1
Bene
9
Neutro
0
Cautela
0
Evitare
10% bene
90% neutro
0% cautela
0% evitare
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Water
Aqua
solvent
→
Butylene Glycol
humectant masking skin conditioning solvent viscosity controlling
→
Hydroxyethylpiperazine Ethane Sulfonic Acid
HEPES
buffering
→
Propanediol
Zemea
Glycolic Acid
buffering
→
Sodium Hydroxide
lye
buffering denaturant
→
Caprylyl Glycol
deodorant emollient hair conditioning skin conditioning
→
Xanthan Gum
binding emulsifying emulsion stabilising gel forming skin conditioning surfactant viscosity controlling
→
Potassium Sorbate
preservative
→
Disodium EDTA
chelating viscosity controlling
→
Состав
Water, Butylene Glycol, Hydroxyethylpiperazine Ethane Sulfonic Acid, Propanediol, Glycolic Acid, Sodium Hydroxide, Caprylyl Glycol, Xanthan Gum, Potassium Sorbate, Disodium EDTA
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