Apolosophy
Apolosophy Sensitive Day Cream
Moisturizing day cream for sensitive skin
5
Bene
17
Neutro
0
Cautela
0
Evitare
23% bene
77% neutro
0% cautela
0% evitare
Circa il prodotto
- Marchio
- Apolosophy
- Ingrediente
- 22
- Attivo
- 3
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Water
Aqua
solvent
→
Cetearyl Alcohol
emollient emulsifying emulsion stabilising foam boosting opacifying surfactant viscosity controlling
→
Canola Oil
emollient skin conditioning
→
Helianthus Annuus Hybrid Oil
emollient
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Dicaprylyl Ether
emollient skin conditioning solvent
→
Dimethicone
Avena Sativa Kernel Oil
skin conditioning
→
Betaine
antistatic hair conditioning humectant skin conditioning viscosity controlling
→
Butyrospermum Parkii Butter
Shea Butter
skin conditioning viscosity controlling
→
Cetearyl Glucoside
emulsifying surfactant
→
Phenoxyethanol
preservative
→
Ammonium Acryloyldimethyltaurate/VP Copolymer
Aristoflex AVC
viscosity controlling
→
Sodium Benzoate
anticorrosive masking preservative
→
Xanthan Gum
binding emulsifying emulsion stabilising gel forming skin conditioning surfactant viscosity controlling
→
Potassium Sorbate
preservative
→
Citric Acid
buffering chelating masking
→
Tocopherol
Vitamin E
antioxidant masking skin conditioning
→
Maltodextrin
absorbent binding emulsion stabilising film forming hair conditioning skin conditioning
→
Beta-Glucan
skin conditioning
→
Levulinic Acid
perfuming skin conditioning
→
Sodium Levulinate
skin conditioning
→
Состав
Water, Cetearyl Alcohol, Canola Oil, Helianthus Annuus Hybrid Oil, Glycerin, Dicaprylyl Ether, Dimethicone, Avena Sativa Kernel Oil, Betaine, Butyrospermum Parkii Butter, Cetearyl Glucoside, Phenoxyethanol, Ammonium Acryloyldimethyltaurate/VP Copolymer, Sodium Benzoate, Xanthan Gum, Potassium Sorbate, Citric Acid, Tocopherol, Maltodextrin, Beta-Glucan, Levulinic Acid, Sodium Levulinate
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