Four Reasons
Four Reasons Sensitive Moisture Mask
Fragrance-free intensively moisturizing hair mask, suitable for sensitive scalp no fragrance no dryness no rough & crunchy hair nothing unnecessary
2
Bien
15
Neutre
0
Mise en garde
0
Éviter
12% bien
88% neutre
0% mise en garde
0% éviter
À propos du produit
- Marque
- Four Reasons
- Ingrédients
- 17
- Actifs
- 1
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Water
Aqua
solvent
→
Cetearyl Alcohol
emollient emulsifying emulsion stabilising foam boosting opacifying surfactant viscosity controlling
→
Behenamidopropyl Dimethylamine
antistatic emulsifying
→
Dipalmitoylethyl Hydroxyethylmonium Methosulfate
antistatic detangling hair conditioning
→
Lactic Acid
buffering humectant skin conditioning
→
Silicone Quaternium-18
emollient hair conditioning
→
Guar Hydroxypropyltrimonium Chloride
antistatic film forming skin conditioning viscosity controlling
→
Ceteareth-20
cleansing emulsifying surfactant
→
Sodium Benzoate
anticorrosive masking preservative
→
Trideceth-6
emulsifying surfactant
→
Cetyl Hydroxyethylcellulose
emulsion stabilising film forming viscosity controlling
→
Saccharide Isomerate
humectant
→
Potassium Sorbate
preservative
→
Trideceth-12
emulsifying surfactant
→
Phenoxyethanol
preservative
→
Citric Acid
buffering chelating masking
→
Sodium Citrate
buffering chelating masking
→
Состав
Water, Cetearyl Alcohol, Behenamidopropyl Dimethylamine, Dipalmitoylethyl Hydroxyethylmonium Methosulfate, Lactic Acid, Silicone Quaternium-18, Guar Hydroxypropyltrimonium Chloride, Ceteareth-20, Sodium Benzoate, Trideceth-6, Cetyl Hydroxyethylcellulose, Saccharide Isomerate, Potassium Sorbate, Trideceth-12, Phenoxyethanol, Citric Acid, Sodium Citrate
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