Shiseido
Shiseido Ibuki Gentle Cleanser
An ultragentle cleanser to remove impurities without stripping the skin’s essential moisture.
5
Bien
13
Neutral
0
Precaución
4
Evitar
23% bien
59% neutral
0% precaución
18% evitar
Sobre el producto
- Marca
- Shiseido
- Ingredientes
- 22
- Activos
- 3
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Water
Aqua
solvent
→
Stearic Acid
PEG-8
humectant solvent
→
Myristic Acid
cleansing emulsifying perfuming
→
Potassium Hydroxide
buffering
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Lauric Acid
cleansing emulsifying surfactant
→
Alcohol Denat.
antifoaming antimicrobial astringent masking solvent viscosity controlling
→
Butylene Glycol
humectant masking skin conditioning solvent viscosity controlling
→
Glyceryl Stearate SE
emulsifying
→
Trehalose
humectant moisturising
→
Polyquaternium-7
antistatic film forming
→
Cocamidopropyl Betaine
antistatic cleansing foam boosting hair conditioning surfactant viscosity controlling
→
Sodium Methyl Cocoyl Taurate
cleansing foaming surfactant
→
Tocopherol
Vitamin E
antioxidant masking skin conditioning
→
Parfum/Fragrance
Fragrance, Parfum
Disodium EDTA
chelating viscosity controlling
→
Sodium Benzoate
anticorrosive masking preservative
→
Limonene
deodorant perfuming solvent
→
Hexyl Cinnamal
perfuming
→
Butylphenyl Methylpropional
Lilial
perfuming
→
Betaine
antistatic hair conditioning humectant skin conditioning viscosity controlling
→
Состав
Water, Stearic Acid, PEG-8, Myristic Acid, Potassium Hydroxide, Glycerin, Lauric Acid, Alcohol Denat., Butylene Glycol, Glyceryl Stearate SE, Trehalose, Polyquaternium-7, Cocamidopropyl Betaine, Sodium Methyl Cocoyl Taurate, Tocopherol, Parfum/Fragrance, Disodium EDTA, Sodium Benzoate, Limonene, Hexyl Cinnamal, Butylphenyl Methylpropional, Betaine
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