COSMETOCRITICO
COSMETOCRITICO Peel & Repair Deo
Exfoliating, repairing, and deodorizing foot balm. Deeply moisturizes, reduces, and prevents calluses and foot odor thanks to 20% urea and 3% shikimic and salicylic acids.
4
Bien
18
Neutral
0
Precaución
1
Evitar
17% bien
78% neutral
0% precaución
4% evitar
Sobre el producto
- Marca
- COSMETOCRITICO
- Ingredientes
- 23
- Activos
- 4
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Water
Aqua
solvent
→
Urea
Carbamide
Alcohol Denat.
antifoaming antimicrobial astringent masking solvent viscosity controlling
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Caprylic/Capric Triglyceride
masking perfuming skin conditioning
→
Dimethicone
Behenyl Alcohol
binding emollient emulsion stabilising viscosity controlling
→
Lactic Acid
buffering humectant skin conditioning
→
Methylpropanediol
solvent
→
Cetyl Alcohol
emollient emulsifying emulsion stabilising foam boosting masking opacifying surfactant viscosity controlling
→
Glyceryl Stearate
emollient emulsifying
→
Salicylic Acid
BHA
antidandruff hair conditioning keratolytic masking preservative skin conditioning
→
Shikimic Acid
antidandruff deodorant skin conditioning
→
PEG-75 Stearate
surfactant
→
Propylene Glycol
humectant skin conditioning solvent viscosity controlling
→
Stearyl Alcohol
emollient emulsifying emulsion stabilising foam boosting masking opacifying refatting surfactant viscosity controlling
→
Caprylyl Glycol
deodorant emollient hair conditioning skin conditioning
→
Ceteth-20
cleansing emulsifying surfactant
→
Steareth-20
cleansing emulsifying surfactant
→
Ethylhexylglycerin
deodorant skin conditioning
→
Xanthan Gum
binding emulsifying emulsion stabilising gel forming skin conditioning surfactant viscosity controlling
→
Phenylpropanol
masking perfuming solvent
→
Octenidine Hcl
antimicrobial
→
Состав
Water, Urea, Alcohol Denat., Glycerin, Caprylic/Capric Triglyceride, Dimethicone, Behenyl Alcohol, Lactic Acid, Methylpropanediol, Cetyl Alcohol, Glyceryl Stearate, Salicylic Acid, Shikimic Acid, PEG-75 Stearate, Propylene Glycol, Stearyl Alcohol, Caprylyl Glycol, Ceteth-20, Steareth-20, Ethylhexylglycerin, Xanthan Gum, Phenylpropanol, Octenidine Hcl
Urea
Carbamide
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Lactic Acid
buffering humectant skin conditioning
→
Salicylic Acid
BHA
antidandruff hair conditioning keratolytic masking preservative skin conditioning
→
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