For Beloved One
For Beloved One Advanced Hyaluronic Acid GHK-Cu Moisturizing Serum
This penetrating serum leaves your skin dewy and glowing all day long. Rare GHK-Cu and copper gluconate accelerate skin repair and restoration while improving moisture retention ability, while the rich but non-greasy texture targets deep skin layers with every application.
10
Good
13
Neutral
0
Caution
0
Avoid
43% good
57% neutral
0% caution
0% avoid
About product
- Brand
- For Beloved One
- Ingredients
- 23
- Actives
- 8
Full ingredient list — For Beloved One Advanced Hyaluronic Acid GHK-Cu Moisturizing Serum
Hover a row · click for the card
Water
Aqua
solvent
→
Pentylene Glycol
skin conditioning solvent
→
Butylene Glycol
humectant masking skin conditioning solvent viscosity controlling
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Exo-H
Alteromonas Ferment Extract
skin conditioning
→
Sodium Hyaluronate
humectant skin conditioning
→
Copper Tripeptide-1
GHK-Cu, Copper Peptide
skin conditioning
→
Copper Gluconate
skin conditioning skin protecting
→
Hydrolyzed Hyaluronic Acid
hair conditioning humectant skin conditioning
→
PPG-12-Buteth-16
hair conditioning skin conditioning solvent
→
Hydroxyethyl Ethylcellulose
binding emulsifying emulsion stabilising film forming viscosity controlling
→
Chlorphenesin
antimicrobial preservative
→
Arginine
antistatic hair conditioning masking skin conditioning
→
Trehalose
humectant moisturising
→
Urea
Carbamide
Serine
Glyceryl Polyacrylate
film forming
→
Pullulan
binding film forming
→
Algin
Sodium Alginate
binding masking viscosity controlling
→
Caprylyl Glycol
deodorant emollient hair conditioning skin conditioning
→
Disodium Phosphate
anticorrosive buffering masking
→
Potassium Phosphate
buffering
→
Состав
Water, Pentylene Glycol, Butylene Glycol, Glycerin, Exo-H, Alteromonas Ferment Extract, Sodium Hyaluronate, Copper Tripeptide-1, Copper Gluconate, Hydrolyzed Hyaluronic Acid, PPG-12-Buteth-16, Hydroxyethyl Ethylcellulose, Chlorphenesin, Arginine, Trehalose, Urea, Serine, Glyceryl Polyacrylate, Pullulan, Algin, Caprylyl Glycol, Disodium Phosphate, Potassium Phosphate
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Alteromonas Ferment Extract
skin conditioning
→
Sodium Hyaluronate
humectant skin conditioning
→
Copper Tripeptide-1
GHK-Cu, Copper Peptide
skin conditioning
→
Copper Gluconate
skin conditioning skin protecting
→
Arginine
antistatic hair conditioning masking skin conditioning
→
Urea
Carbamide
Serine
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