Shiseido Benefiance Pure Retinol Intensive Revitalizing Face Mask
Листовая маска для ухода за лицом с увлажняющими свойствами улучшает текстуру.
Список ингредиентов
Ключевые ингредиенты:
- antioxidant: Tocopheryl Acetate, Magnesium Ascorbyl Phosphate, Panax Ginseng Root Extract
- skin-identical ingredient: Glycerin, Squalane
- cell-communicating ingredient: Retinol
Полный список ингредиентов: Water, Butylene Glycol, Pentaerythrityl Tetraethylhexanoate, Diphenylsiloxy Phenyl Trimethicone, Glycerin, Dipropylene Glycol, Alcohol Denat., Betaine, PEG-60 Hydrogenated Castor Oil, Phenoxyethanol, Methylparaben, Sodium Citrate, Carbomer, Parfum/Fragrance, BHT, Squalane, Tocopheryl Acetate, Xanthan Gum, Potassium Hydroxide, Retinol, Polysorbate 20, Citric Acid, Alcohol, Trisodium EDTA, Arginine Hcl, Magnesium Ascorbyl Phosphate, Glucosyl Hesperidin, Butylphenyl Methylpropional, Hexyl Cinnamal, Alpha-Isomethyl Ionone, Linalool, Limonene, Citronellol, Panax Ginseng Root Extract, Geraniol, Sodium Acetylated Hyaluronate, Hydroxyproline, Rubus Suavissimus Leaf Extract, Chlorella Vulgaris Extract, Beta-Carotene