LOOKS & MEII Centella Relaxation Perfect Calming Mask
Идеальная успокаивающая маска содержит 50 000 частей на миллион центеллики™, которая успокаивает раздраженную кожу, вызванную воздействием внешней среды, и сохраняет ее сияющей и здоровой.
Список ингредиентов
Ключевые ингредиенты:
- antioxidant: Centella Asiatica Extract, Portulaca Oleracea Extract, Calendula Officinalis Flower Extract, Camellia Sinensis Leaf Extract
- skin-identical ingredient: Glycine, Pca, Glycerin, Arginine, Hyaluronic Acid, Sodium Hyaluronate, Serine, Threonine, Alanine
- antimicrobial/antibacterial: Hamamelis Virginiana Leaf Extract
- emollient: Aloe Barbadensis Leaf Extract, Malva Sylvestris Extract
- soothing: Allantoin
Полный список ингредиентов: Water, Glycerin, Glycereth-26, Dipropylene Glycol, Centella Asiatica Extract, Aloe Barbadensis Leaf Extract, Melaleuca Alternifolia Leaf Water, Hamamelis Virginiana Leaf Extract, Portulaca Oleracea Extract, Calendula Officinalis Flower Extract, Camellia Sinensis Leaf Extract, Anthemis Nobilis Flower Water, Guaiazulene, Cyclopentasiloxane, Caprylic/Capric Triglyceride, Hydroxyacetophenone, Sodium Acrylate/Sodium Acryloyldimethyl Taurate Copolymer, Cyclohexasiloxane, C15-19 Alkane, Butylene Glycol, Hydroxyethylcellulose, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Arginine, Allantoin, Propanediol, Dimethicone/Vinyl Dimethicone Crosspolymer, Polyglyceryl-6 Laurate, Dioscorea Japonica Root Extract, Malva Sylvestris Extract, Hibiscus Esculentus Fruit Extract, Maris Aqua, Polyglycerin-6, Sorbitan Oleate, Sorbitan Isostearate, Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Glyceryl Polyacrylate, Sodium Hyaluronate, Serine, Threonine, Alanine, Glutamic Acid, Glycine, Pca, Pentylene Glycol, Disodium EDTA, Caprylyl Glycol, Ethylhexylglycerin, 1,2-Hexanediol, Parfum/Fragrance