HAUS LABS Triclone™ Skin Tech Hydrating + De-puffing Concealer

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HAUS LABS Triclone™ Skin Tech Hydrating + De-puffing Concealer
Производитель: HAUS LABS

Чистый, легкий, стойкий, не вызывающий угревой сыпи консилер, который не просто маскирует - он заметно растушевывает, осветляет и маскирует кожу, создавая плотное покрытие средней плотности, которое снимается после 2 недель использования.

Список ингредиентов

Ключевые ингредиенты:

Полный список ингредиентов: Water, Glycerin, Diphenylsiloxy Phenyl Trimethicone, Trimethylsiloxysilicate, C13-15 Alkane, Caprylyl Methicone, Lauryl Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, Isododecane, Dimethicone, Methyl Trimethicone, Polypropylsilsesquioxane, Phenyl Trimethicone, Disteardimonium Hectorite, Polymethylsilsesquioxane, Magnesium Sulfate, Acrylates/Dimethicone Copolymer, Arnica Montana Flower Extract, Niacinamide, Squalane, Hydrolyzed Hyaluronic Acid, Coleus Forskohlii Root Extract, Sodium Hyaluronate, Hyaluronic Acid, Pseudozyma Epicola/Camellia Sinensis Seed Oil Ferment Extract Filtrate, Pseudozyma Epicola/Apricot Kernel Oil/Olive Fruit Oil/Sweet Almond Oil/Sunflower Seed Oil/Licorice Root Extract Ferment Extract Filtrate, Pseudozyma Epicola/Apricot Kernel Oil/Olive Fruit Oil/Sunflower Seed Oil/Sweet Almond Oil/(Angelica Gigas/Lithospermum Erythrorhizon) Root Extract Ferment Extract Filtrate, Solanum Lycopersicum Fruit Extract, Dunaliella Salina Extract, Sodium Acetylated Hyaluronate, Sodium Hyaluronate Crosspolymer, Pseudanabaena Galeata Extract, Hydrolyzed Sodium Hyaluronate, Tocopherol, Potassium Hyaluronate, Pseudozyma Epicola/Sunflower Seed Oil Ferment Extract Filtrate, Betaine, Hydroxypropyltrimonium Hyaluronate, Caprylyl Glycol, Aloe Barbadensis Leaf Extract, Sorbitan Sesquioleate, Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, Acrylates/Polytrimethylsiloxymethacrylate Copolymer, 1,2-Hexanediol, Ethylhexylglycerin, Dimethicone/Vinyl Dimethicone Crosspolymer, Cetearyl Dimethicone/Vinyl Dimethicone Crosspolymer, Triethoxycaprylylsilane, Xanthan Gum, Silica Silylate, Aluminum Hydroxide, Boron Nitride, Iron Oxides, Ci 77891