Rohto Mentholatum
Rohto Mentholatum Hada Labo® Loção Facial Kiwamizu Hatomugi
Facial moisturizing lotion. Oil-free, contains the powerful compound of Japanese coix plant extract (coix lacryma-jobi ma-yuen seed extract) that soothes and moisturizes the skin. Contains arginine, which, together with zinc hydrolyzed hyaluronate, a type of hyaluronic acid, attracts and retains moisture. Formulated with zinc gluconate, which has astringent properties, it minimizes the appearance of enlarged pores. The skin is hydrated and has an even texture. Free of dyes and fragrances Recommended for all skin types, especially combination and oily skin with a tendency to acne
Состав (INCI)
Copper Gluconate
skin conditioning skin protecting
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Diglycerin
humectant skin conditioning
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Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
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Arginine
antistatic hair conditioning masking skin conditioning
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Zinc Gluconate
deodorant skin conditioning
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Ascorbyl Glucoside
Form of Vitamin C
antioxidant
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Calcium Chloride
astringent viscosity controlling
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Succinic Acid
buffering masking
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Potassium Chloride
viscosity controlling
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Coix Lacryma-Jobi Ma-Yuen Seed Extract
skin conditioning
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Alcohol
Ethanol
antifoaming antimicrobial astringent masking solvent viscosity controlling
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Betaine
antistatic hair conditioning humectant skin conditioning viscosity controlling
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Sodium Chloride
Salt
bulking masking oral care viscosity controlling
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Magnesium Aspartate
skin conditioning
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Methylparaben
preservative
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Polysorbate 20
emulsifying surfactant
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Disodium Succinate
masking surfactant
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Xanthan Gum
binding emulsifying emulsion stabilising gel forming skin conditioning surfactant viscosity controlling
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Propanediol
Zemea
Phenoxyethanol
preservative
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Water
Aqua
solvent
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Zinc Hydrolyzed Hyaluronate
humectant skin conditioning
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Poly(1,2-Butanediol)-4 PEG/PPG-29/9 Methyl Glucose
Butylene Glycol
humectant masking skin conditioning solvent viscosity controlling
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Styrene/Vp Copolymer
film forming opacifying
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