SON & PARK
SON & PARK Beauty Full Mask Clean Type
Moisturizing mask contains hyaluronic acid and a blend of AHA from flower extract to help renew dull skin.
Состав (INCI)
Allantoin
skin conditioning skin protecting soothing
ключевой
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Viola Tricolor Extract
emollient skin protecting soothing
ключевой
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Tartaric Acid
buffering masking
ключевой
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Malic Acid
buffering
ключевой
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Centella Asiatica Leaf Extract
skin conditioning
ключевой
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Portulaca Oleracea Extract
Purslane Extract
skin conditioning
ключевой
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Caffeine
perfuming skin conditioning
ключевой
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Ascorbic Acid
Vitamin C, L-ascorbic acid
antioxidant buffering masking skin conditioning
ключевой
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Sodium Benzoate
anticorrosive masking preservative
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Parfum/Fragrance
Fragrance, Parfum
Althaea Rosea Flower Extract
skin conditioning
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Agave Americana Stem Extract
skin conditioning
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Butylene Glycol
humectant masking skin conditioning solvent viscosity controlling
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Agrimonia Eupatoria Extract
astringent
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Hibiscus Sabdariffa Flower Extract
Hibiscus Extract
skin conditioning
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Water
Aqua
solvent
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Methylpropanediol
solvent
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Melaleuca Alternifolia Leaf Extract
Tea Tree Leaf Extract
perfuming skin conditioning
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Rosa Damascena Flower Water
Damask Rose Flower Water, Rose Hydrosol
masking skin conditioning skin protecting
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Hydrolyzed Hyaluronic Acid
hair conditioning humectant skin conditioning
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Phenoxyethanol
preservative
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Potassium Sorbate
preservative
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PEG-40 Hydrogenated Castor Oil
emulsifying surfactant
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Crataegus Monogyna Flower Extract
skin conditioning
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Citric Acid
buffering chelating masking
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Ethylhexylglycerin
deodorant skin conditioning
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Xanthan Gum
binding emulsifying emulsion stabilising gel forming skin conditioning surfactant viscosity controlling
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Propylene Glycol
humectant skin conditioning solvent viscosity controlling
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Hydroxyacetophenone
antioxidant
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Disodium EDTA
chelating viscosity controlling
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Caprylyl Glycol
deodorant emollient hair conditioning skin conditioning
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1,2-Hexanediol
skin conditioning solvent
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