M&S Formula
M&S Formula Gentle Cleanse Exfoliating Polish
Gentle exfoliating cleansing polish
2
Bene
18
Neutro
0
Cautela
0
Evitare
10% bene
90% neutro
0% cautela
0% evitare
Circa il prodotto
- Marchio
- M&S Formula
- Ingrediente
- 20
- Attivo
- 1
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Water
Aqua
solvent
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Perlite
absorbent bulking
→
Cetearyl Alcohol
emollient emulsifying emulsion stabilising foam boosting opacifying surfactant viscosity controlling
→
Paraffinum Liquidum
Mineral Oil
antistatic emollient skin protecting solvent
→
Alumina
Aluminum Oxide, Al2O3
abrasive absorbent anticaking bulking opacifying viscosity controlling
→
Caprylic/Capric Triglyceride
masking perfuming skin conditioning
→
Dimethicone
Petrolatum
Petroleum jelly, Vaseline
antistatic emollient
→
Phenoxyethanol
preservative
→
Glyceryl Stearate
emollient emulsifying
→
PEG-100 Stearate
surfactant
→
Carbomer
emulsion stabilising gel forming viscosity controlling
→
Citric Acid
buffering chelating masking
→
Parfum/Fragrance
Fragrance, Parfum
Chlorphenesin
antimicrobial preservative
→
Caprylyl Glycol
deodorant emollient hair conditioning skin conditioning
→
Xanthan Gum
binding emulsifying emulsion stabilising gel forming skin conditioning surfactant viscosity controlling
→
Disodium EDTA
chelating viscosity controlling
→
Sodium Hydroxide
lye
buffering denaturant
→
Состав
Water, Glycerin, Perlite, Cetearyl Alcohol, Paraffinum Liquidum, Alumina, Caprylic/Capric Triglyceride, Dimethicone, Petrolatum, Phenoxyethanol, Glyceryl Stearate, PEG-100 Stearate, Carbomer, Citric Acid, Parfum/Fragrance, Chlorphenesin, Caprylyl Glycol, Xanthan Gum, Disodium EDTA, Sodium Hydroxide
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