Hada Labo
Hada Labo AHA+BHA Mild Peeling Lotion (MY)
Free from fragrance, colorant, mineral oil, alcohol
1
Bene
7
Neutro
0
Cautela
0
Evitare
13% bene
88% neutro
0% cautela
0% evitare
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Water
Aqua
solvent
→
Gluconic Acid
chelating perfuming
→
Pentylene Glycol
skin conditioning solvent
→
Butylene Glycol
humectant masking skin conditioning solvent viscosity controlling
→
Tranexamic Acid
astringent skin conditioning
→
Polyquaternium-51
film forming skin conditioning
→
Sodium Metabisulfite
antioxidant preservative reducing
→
Phenoxyethanol
preservative
→
Состав
Water, Gluconic Acid, Pentylene Glycol, Butylene Glycol, Tranexamic Acid, Polyquaternium-51, Sodium Metabisulfite, Phenoxyethanol
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