one.two.free!
one.two.free! Afterglow Face Mask
Refreshing and hydrating after sun mask.
6
Bien
11
Neutre
0
Mise en garde
1
Éviter
33% bien
61% neutre
0% mise en garde
6% éviter
À propos du produit
- Marque
- one.two.free!
- Ingrédients
- 18
- Actifs
- 3
Survolez une ligne · cliquez pour la carte
Water
Aqua
solvent
→
Caprylic/Capric Triglyceride
masking perfuming skin conditioning
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Cetearyl Alcohol
emollient emulsifying emulsion stabilising foam boosting opacifying surfactant viscosity controlling
→
Propanediol
Zemea
Butyrospermum Parkii Butter
Shea Butter
skin conditioning viscosity controlling
→
Glucomannan
Amorphophallus Konjac Root Powder
skin conditioning skin protecting
→
Parfum/Fragrance
Fragrance, Parfum
Sodium Stearoyl Glutamate
cleansing emulsifying hair conditioning skin conditioning
→
Sodium Benzoate
anticorrosive masking preservative
→
Butylene Glycol
humectant masking skin conditioning solvent viscosity controlling
→
Potassium Sorbate
preservative
→
Chondrus Crispus Extract
Carrageenan Extract, Seaweed Extract
skin conditioning viscosity controlling
→
Sodium Hyaluronate
humectant skin conditioning
→
Aloe Barbadensis Leaf Juice Powder
skin conditioning
→
Menthyl Lactate
masking refreshing
→
Citric Acid
buffering chelating masking
→
Aspergillus/Camellia Sinensis Leaf Ferment Extract Filtrate
skin conditioning
→
Состав
Water, Caprylic/Capric Triglyceride, Glycerin, Cetearyl Alcohol, Propanediol, Butyrospermum Parkii Butter, Glucomannan, Parfum/Fragrance, Sodium Stearoyl Glutamate, Sodium Benzoate, Butylene Glycol, Potassium Sorbate, Chondrus Crispus Extract, Sodium Hyaluronate, Aloe Barbadensis Leaf Juice Powder, Menthyl Lactate, Citric Acid, Aspergillus/Camellia Sinensis Leaf Ferment Extract Filtrate
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