Natasha Denona
Natasha Denona Contour Sculpting Powder
A contouring and sculpting powder with a smooth, velvety texture that melts into skin for seamless shaping.
3
Bien
21
Neutre
0
Mise en garde
1
Éviter
12% bien
84% neutre
0% mise en garde
4% éviter
À propos du produit
- Marque
- Natasha Denona
- Ingrédients
- 25
- Actifs
- 2
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Talc
abrasive absorbent anticaking bulking opacifying skin protecting
→
Mica
CI 77019
anticaking bulking cosmetic colorant opacifying
→
Alumina
Aluminum Oxide, Al2O3
abrasive absorbent anticaking bulking opacifying viscosity controlling
→
Dimethicone
Silica
abrasive absorbent anticaking bulking opacifying viscosity controlling
→
Octyldodecyl Stearoyl Stearate
emollient viscosity controlling
→
Caprylyl Glycol
deodorant emollient hair conditioning skin conditioning
→
Phenoxyethanol
preservative
→
Hexylene Glycol
emulsifying perfuming skin conditioning solvent surfactant
→
Polybutene
binding viscosity controlling
→
Nylon-12
bulking opacifying viscosity controlling
→
Water
Aqua
solvent
→
Tin Oxide
CI 77861, Tin Dioxide
abrasive bulking opacifying viscosity controlling
→
Benzyl Alcohol
perfuming preservative solvent viscosity controlling
→
Dehydroacetic Acid
Geogard 111A
preservative
→
Sodium Hyaluronate
humectant skin conditioning
→
Tocopherol
Vitamin E
antioxidant masking skin conditioning
→
Lecithin
antistatic emollient emulsifying skin conditioning
→
Ascorbyl Palmitate
Form of Vitamin C
antioxidant masking
→
Glyceryl Stearate
emollient emulsifying
→
Glyceryl Oleate
emollient emulsifying perfuming
→
Citric Acid
buffering chelating masking
→
Ci 77891
Titanium Dioxide/Ci 77891
cosmetic colorant
→
Iron Oxides
Ci 77491/77492/77499
Ci 15850
Red 6, Red 7
cosmetic colorant
→
Состав
Talc, Mica, Alumina, Dimethicone, Silica, Octyldodecyl Stearoyl Stearate, Caprylyl Glycol, Phenoxyethanol, Hexylene Glycol, Polybutene, Nylon-12, Water, Tin Oxide, Benzyl Alcohol, Dehydroacetic Acid, Sodium Hyaluronate, Tocopherol, Lecithin, Ascorbyl Palmitate, Glyceryl Stearate, Glyceryl Oleate, Citric Acid, Ci 77891, Iron Oxides, Ci 15850
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