Genuine Namir Ha Plant Extract Moisturising Mask
Он содержит увлажняющие компоненты с несколькими компонентами, которые способствуют глубокому увлажнению кожи.
Список ингредиентов
Ключевые ингредиенты:
- antioxidant: Carthamus Tinctorius Seed Oil, Olea Europaea Fruit Oil, Tocopherol
- skin-identical ingredient: Glycerin, Sodium Hyaluronate, Arginine, Squalane
- moisturizer/humectant: Dipotassium Glycyrrhizate
Полный список ингредиентов: Water, Propanediol, Glycerin, Sodium Hyaluronate, Hydrolyzed Sodium Hyaluronate, Saccharide Isomerate, Dipotassium Glycyrrhizate, Arginine, Phaseolus Radiatus Seed Extract, Hippophae Rhamnoides Extract, Hibiscus Mutabilis Flower Extract, Bis-PEG-15 Methyl Ether Dimethicone, Betaine, Glycereth-26, Raffinose, Glucose, Butylene Glycol, Caprylic/Capric Triglyceride, PEG-20 Hydrogenated Castor Oil, Sorbitan Oleate, Squalane, Carthamus Tinctorius Seed Oil, Oxidized Corn Oil, Glyceryl Caprylate, Lauryl Glucoside, Pyrus Malus Seed Extract, Olea Europaea Fruit Oil, Simmondsia Chinensis Seed Extract, Tocopherol, Helianthus Annuus Seed Oil, Hydroxyethylcellulose, Carbomer, Sodium Polyacrylate, Caprylhydroxamic Acid, Caprylyl Glycol, Hydroxyacetophenone, Disodium EDTA