Hikari Laboratories
Hikari Laboratories Anti Stress Massage Mask
Anti stress luxury mask.
Состав (INCI)
Titanium Dioxide
cosmetic colorant opacifying uv absorber uv filter
ключевой
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Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
ключевой
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Tocopherol
Vitamin E
antioxidant masking skin conditioning
ключевой
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Hyaluronic Acid
antistatic humectant moisturising skin conditioning
ключевой
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Tocopheryl Acetate
Vitamin E Acetate
antioxidant skin conditioning
ключевой
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Polyglyceryl-3 Polyricinoleate
emulsifying viscosity controlling
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Lecithin
antistatic emollient emulsifying skin conditioning
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Isononyl Isononanoate
antistatic emollient skin conditioning
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Mica
CI 77019
anticaking bulking cosmetic colorant opacifying
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Benzyl Salicylate
perfuming uv absorber
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Coenochloris Signiensis Extract
skin conditioning
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Nicotinamide Adenine Dinucleotide
skin conditioning
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Calcium Lactate
astringent buffering keratolytic
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Sucrose Laurate
emollient emulsifying skin conditioning surfactant
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Sucrose Stearate
emollient emulsifying skin conditioning surfactant
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Conchiolin Powder
abrasive
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Arnica Montana Flower Extract
Mountain Arnica Extract
masking perfuming skin conditioning
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Maltodextrin
absorbent binding emulsion stabilising film forming hair conditioning skin conditioning
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Parfum/Fragrance
Fragrance, Parfum
Linalool
deodorant perfuming
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Geraniol
perfuming tonic
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Citronellol
perfuming
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Helianthus Annuus Seed Oil
Sunflower Oil
emollient masking skin conditioning
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Caprylic/Capric Triglyceride
masking perfuming skin conditioning
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Behenamidopropyl Dimethylamine Behenate
antistatic hair conditioning skin conditioning viscosity controlling
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Water
Aqua
solvent
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Propylene Glycol Dipelargonate
emollient viscosity controlling
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Leontopodium Alpinum Flower Extract
skin conditioning
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