Photozyme
Photozyme Md Vitamin C & E Ferulic Acid Serum
This expertly formulated serum fights visible signs of aging, including wrinkles, fine lines, acne, dark spots and sun damage with the nourishing power of vitamin c, vitamin e, ferulic acid and dna repair enzymes.
6
Bien
9
Neutral
0
Precaución
0
Evitar
40% bien
60% neutral
0% precaución
0% evitar
Sobre el producto
- Marca
- Photozyme
- Ingredientes
- 15
- Activos
- 7
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Water
Aqua
solvent
→
Ethoxydiglycol
humectant perfuming solvent
→
Ascorbic Acid
Vitamin C, L-ascorbic acid
antioxidant buffering masking skin conditioning
→
Propylene Glycol
humectant skin conditioning solvent viscosity controlling
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Sodium Hyaluronate
humectant skin conditioning
→
Panthenol
Pro-Vitamin B5
antistatic hair conditioning skin conditioning
→
Laureth-23
cleansing emulsifying surfactant
→
Ferulic Acid
antimicrobial antioxidant
→
Photolyase
Arabidopsis Thaliana Extract
antioxidant
→
Tocopherol
Vitamin E
antioxidant masking skin conditioning
→
Phenoxyethanol
preservative
→
Ethylhexylglycerin
deodorant skin conditioning
→
Triethanolamine
buffering emulsifying masking surfactant
→
Состав
Water, Ethoxydiglycol, Ascorbic Acid, Propylene Glycol, Glycerin, Sodium Hyaluronate, Panthenol, Laureth-23, Ferulic Acid, Photolyase, Arabidopsis Thaliana Extract, Tocopherol, Phenoxyethanol, Ethylhexylglycerin, Triethanolamine
Ascorbic Acid
Vitamin C, L-ascorbic acid
antioxidant buffering masking skin conditioning
→
Glycerin
Glycerol
denaturant hair conditioning humectant oral care perfuming skin conditioning skin protecting solvent viscosity controlling
→
Sodium Hyaluronate
humectant skin conditioning
→
Panthenol
Pro-Vitamin B5
antistatic hair conditioning skin conditioning
→
Ferulic Acid
antimicrobial antioxidant
→
Arabidopsis Thaliana Extract
antioxidant
→
Tocopherol
Vitamin E
antioxidant masking skin conditioning
→
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