PATTERN
PATTERN Styling Custard
The lightweight & slippy styling custard makes hair care easier at every age. The custard is perfect for wet or dry ponytails, flat twists, braid-outs, twist-outs & bantu knots.
4
Good
12
Neutral
0
Caution
7
Avoid
17% good
52% neutral
0% caution
30% avoid
Formula Score
?
52
/100
Average formula
Earlier in the ingredient list = higher weight in the score
About product
- Brand
- PATTERN
- Ingredients
- 23
- Actives
- 2
Full ingredient list — PATTERN Styling Custard
Hover a row · click for the card
Water
Aqua
Solvent
→
Glycerin
Glycerol
Denaturant Hair conditioning Humectant Oral care Perfuming Skin conditioning Skin protecting Solvent Viscosity controlling
→
Polyquaternium-37
Antistatic Film forming
→
Polysorbate 20
Emulsifying Surfactant
→
Polyquaternium-11
Antistatic Film forming
→
Methyl Gluceth-10
Emulsifying Humectant Moisturising
→
Linum Usitatissimum Seed Oil
Linseed Oil, Flaxseed Oil
Perfuming Skin conditioning
→
Chamomilla Recutita Extract
Skin conditioning
→
Chondrus Crispus Extract
Carrageenan Extract, Seaweed Extract
Skin conditioning Viscosity controlling
→
Agave Rigida Extract
Bulking
→
Panthenol
Pro-Vitamin B5
Antistatic Hair conditioning Skin conditioning
→
Phenoxyethanol
Preservative
→
Parfum/Fragrance
Fragrance, Parfum
Ethylhexylglycerin
Deodorant Skin conditioning
→
Benzyl Benzoate
Antimicrobial Perfuming Solvent
→
Hexyl Cinnamal
Perfuming
→
Amyl Cinnamal
Perfuming
→
Hydroxycitronellal
Perfuming
→
Linalool
Deodorant Perfuming
→
Citronellol
Perfuming
→
Limonene
Deodorant Perfuming Solvent
→
Coumarin
Perfuming
→
Caramel
Cosmetic colorant Masking
→
Состав
Water, Glycerin, Polyquaternium-37, Polysorbate 20, Polyquaternium-11, Methyl Gluceth-10, Linum Usitatissimum Seed Oil, Chamomilla Recutita Extract, Chondrus Crispus Extract, Agave Rigida Extract, Panthenol, Phenoxyethanol, Parfum/Fragrance, Ethylhexylglycerin, Benzyl Benzoate, Hexyl Cinnamal, Amyl Cinnamal, Hydroxycitronellal, Linalool, Citronellol, Limonene, Coumarin, Caramel
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