PATTERN
PATTERN Moisture Milk
Award-winning lightweight cream provides long-lasting moisture to dry hair, reduces breakage & keeps unwanted frizz at bay. Crafted with key ingredients like rich amla oil, irish moss & agave nectar, moisture milk is perfect for providing daily moisture to curly hair & refreshing twist outs & wash-&-gos for the ultimate shine.
5
Good
19
Neutral
0
Caution
7
Avoid
16% good
61% neutral
0% caution
23% avoid
Formula Score
?
55
/100
Average formula
Earlier in the ingredient list = higher weight in the score
About product
- Brand
- PATTERN
- Ingredients
- 31
- Actives
- 2
Full ingredient list — PATTERN Moisture Milk
Hover a row · click for the card
Water
Aqua
Solvent
→
Glycerin
Glycerol
Denaturant Hair conditioning Humectant Oral care Perfuming Skin conditioning Skin protecting Solvent Viscosity controlling
→
Cetearyl Alcohol
Emollient Emulsifying Emulsion stabilising Foam boosting Opacifying Surfactant Viscosity controlling
→
C12-15 Alkyl Benzoate
Antimicrobial Emollient Skin conditioning
→
Cocos Nucifera Oil
Coconut Oil
Hair conditioning Masking Perfuming Skin conditioning
→
Behentrimonium Methosulfate
Antistatic Hair conditioning Surfactant
→
Sesamum Indicum Seed Oil
Sesame Oil
Emollient Hair conditioning Masking Skin conditioning
→
Agave Rigida Extract
Bulking
→
Chondrus Crispus Extract
Carrageenan Extract, Seaweed Extract
Skin conditioning Viscosity controlling
→
Phyllanthus Emblica Fruit Extract
Panthenol
Pro-Vitamin B5
Antistatic Hair conditioning Skin conditioning
→
Glyceryl Stearate SE
Emulsifying
→
Polyquaternium-37
Antistatic Film forming
→
Hydroxypropyl Bis-Hydroxyethyldimonium Chloride
Humectant Skin conditioning
→
Benzyl Alcohol
Perfuming Preservative Solvent Viscosity controlling
→
Polysorbate 60
Emulsifying Surfactant
→
Hydroxyethylcellulose
HEC
Binding Emulsion stabilising Film forming Stabilising Viscosity controlling
→
Pentylene Glycol
Skin conditioning Solvent
→
Ethylhexylglycerin
Deodorant Skin conditioning
→
Phenoxyethanol
Preservative
→
Disodium Phosphate
Anticorrosive Buffering Masking
→
Sodium Phosphate
Buffering
→
Parfum/Fragrance
Fragrance, Parfum
Amyl Cinnamal
Perfuming
→
Benzyl Benzoate
Antimicrobial Perfuming Solvent
→
Citronellol
Perfuming
→
Coumarin
Perfuming
→
Limonene
Deodorant Perfuming Solvent
→
Hexyl Cinnamal
Perfuming
→
Hydroxycitronellal
Perfuming
→
Linalool
Deodorant Perfuming
→
Состав
Water, Glycerin, Cetearyl Alcohol, C12-15 Alkyl Benzoate, Cocos Nucifera Oil, Behentrimonium Methosulfate, Sesamum Indicum Seed Oil, Agave Rigida Extract, Chondrus Crispus Extract, Phyllanthus Emblica Fruit Extract, Panthenol, Glyceryl Stearate SE, Polyquaternium-37, Hydroxypropyl Bis-Hydroxyethyldimonium Chloride, Benzyl Alcohol, Polysorbate 60, Hydroxyethylcellulose, Pentylene Glycol, Ethylhexylglycerin, Phenoxyethanol, Disodium Phosphate, Sodium Phosphate, Parfum/Fragrance, Amyl Cinnamal, Benzyl Benzoate, Citronellol, Coumarin, Limonene, Hexyl Cinnamal, Hydroxycitronellal, Linalool
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